Q1: reproduce the pattern CD required; transparent to the laser beam to expose the photoresist; good adhesion of photoresist to substarte; low cost; envioronment friendly... Q2: photo, can be removed by the developer; resist, resist to the etching Q3: The adhesion promoter is a kind of vapor that can quickly adhere to the silica surface, so that the H2O has no place to adhere Q4: edge bead exists in the edge of the waver, it occurs because the direcion of the surface tension changes from vertical direciton to horizontal Q5: removing the solvent that used to remove the particles and contaminants. Q6: positive photoresist: the part exposed to the light will be removed by developer; negative photoresist...
