He just explains the proces of making wafer’s. And if you dont know what a wafer is.. its the father of microchips. One of those first steps of creating microchips. If i’m wrong, please comment !
Finally, I saw a bunch of videos showing the steps of building a microchip, but none explained to me how a machine was able to manipulate these tiny objects, finally this one explained, with light and chemicals, not with "physical" parts!
Thanks alot Jae-Hwang Lee♥️♥️ Thumbs up!! You are great, shame to those disliking a video like this. Please continue to add more videos like this on the process of transistors/processor production. You the great♥️
Well certainly size matters but 3D printing isn't going to solve Moore's Law issue (at least not permanently); circuit boards components are reaching atomic level.
in 1984 and 1985 the company i did final assembly of semiconductor manufacturing equipment for, received processed wafers that had not passed QC to use as test wafers from customers that bought their products. With the developed wafers it could be seen that the circuitry was inside not on top of the wafer. The chemicals had penetrated wafer in each step. Nothing was on the wafer surface. Maybe like stained glass is not like painted glass. My guess is the glass is porous as far as glass stain is concerned. And wafers were porous as far as the chemicals used for them then,
Semiconductor manufacturing equipment of the mid 1980s was used to spin the wafer as chemical streams or sprays were applied to create the layered images inside. Dopants altered the silica atomic structure to create N or P type properties that in the end left an electronic circuit inside a little square of glass called a fragment that was about the size of a square seen with 1/4 inch graph paper. Photoresist made possible the etching away of doped areas inside the thin glass like wafer. N and P type areas combined formed transistors in the maybe thousands or hundred or hundreds of thousands in tiny areas thanks to a microfiche mask used to expose the photoresist for the etching processes. Like one photograph negative sandwiched between two pieces of glass the mask was. But there were maybe about 200 little square identical images in each maybe 4 inch mask. Protected from contaminants and friction in between the two pieces of glass the film photograph negative was safe to use over and over. But special equipment was used to cleanse the mask to increase yield. Else too many of those little squares would be faulty and not an effective micro miniaturized circuit inside that black rectangular computer chip.
Masks can be big, the light focuses after it passes the mask, so the images are small, like in a camera, a quarter inch cmos captures however wide and far a scene you like.
Silicone is a resistor, right? So making groves into the silicone by photolithography and/or etched away is the paths where electrons ie current would travel through? Would the electrons travel up and down from the grooves to the substrate or along the groves that were etched away?
Maybe I misunderstood you, but there's a difference between silicone (a resistor), and silicon (a semi conductor) which is used as the base for the microchips.
Thank you very much for the video. Could you tell me what are the possible causes of stitching lines? why some lith machine macke stitching line during the lith process an other machines dont have this problem? thank you very much!!!!!
That substrate in that visualization is the same thing as the silicone right? In MEMS technology it's all about the silicone. The substate is cut from silicone. And all etching is happening to that silicone substrate wafer. They're not different things. Correct me if i'm wrong
Please, any wise person to ask some questions? What "silicon" is exactly, i know there are p-type & n-type, this "silicon" is the opposite type of the substrate? How is a mask of one single transistor?
shorter wavelengths of light generate a higher resolution?? the shorter the wavelength the more precise the image... like you said they shortened the wavelength from 365nm to smaller wavelengths, to improve resolution. overall great concise and effective video though
Instead of R~λ/NA, R should be replaced with minimum feature size (CD) so CD~λ/NA so if the wavelength increases the minimum feature size increases and if the wavelength decreases ( frequency increases) and the minimum feature size decreases so smaller patterns can be put on the photoresist layer.
@@psun256 resolution and minimum feature size are inversely proportional. if your resolution increases (think a nice tv) then things aren't blurry and you can see more distinct objects even if they're smaller ( smaller min feature size)
I am really at wrong uni, my knowledge and interests are much above that uni tries to teach me. But what I could do, my country screwd up educational system so much that my only choice was some bad university
Hopefully someone with the expertise and knowledge can help me here I cannot find my answers anywhere... I have been tasked to produce a power point on LED manufacturing and its requirement for vacuum. id be forever grateful for any the answers to any of these questions I've watched endless videos on RU-vid. Thanks in advance. The questions are: 1)A wide variety of systems used in LED manufacture require a certain level of vacuum pressure, what is the necessity for vacuum in this environment? 2) what are the various methods of achieving low and high vacuum pressure (pumps) 3) what measurement systems are used to indicate the various ranges (gauges)
4:38 shorter wavelength of light generate a lower resolution ? From that formula shown obviously the higher wavelength will produce better resolution. BTW it's a good explanation thanks.
The formula is good. Resolution in this case is defined as feature size. Smaller feature size is better. Smaller wavelength means smaller feature size.
@@vibodhj349 he didn't contradict himself. He was asking for a clarification because he assumed that he spotted a contradiction. The first sentence was him quoting the video; I'm guessing the lack of quotation marks confused you.
Wow. Okay. I'm writing a comedy magic show for JSR Micro and this will help in creating the script. ... Silk through phone could be the cleaning process...
At this rate I wouldn't even be surprised if this was all figured out and done in a night. And you'd think the first guy to milk a cow was out there. Who on earth figured this out..
1. Smaller process nodes enable greater efficiency reducing the drain on batteries by electronics at a given performance level 2. We may as well continue to use the lithography industry's developed R&D resources until quick progress ends. Otherwise we'll have to rebuild the labs later on when chips are revisited. 3. Electrochemistry has very different problems, and there are no obvious improvements to be made on current technologies. Funding would go to basic (not applied) research and the chances of useful results would be extremely slim (not attractive to investors). 4. We should still fund basic research more, it's where the most important technologies come from. 5. We need better batteries, and current ones are terrible. There's quite a bit of money going into efforts to change that (both by reducing the need and improving the batteries).
