Ellipsometry & CompleteEASE Part 5: Thickness Measurement of Metals 

This video is an example of a technique used for measuring the thickness of a metal thin film. This is done by depositing a thin film of metal (10-20nm thick) on top of a layer of dielectric material, on top of a Silicon wafer. Its main application is in the preparation and analysis of samples for developing etch processes for the metal layer.
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Disclaimer: This video is intended to serve as supplemental information and cannot replace in-person instrument training. Caltech and KNI are not responsible for how the presented information is translated for use in other facilities.